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Details

Preliminary Control Technology Survey of INMOS Corporation, Colorado Springs, Colorado.

PB84183227

Publication Date	1983
Personal Author	Mihlan, G. J.; Willson, R. D.; Mitchell, R. I.
Page Count	37
Abstract	A walk through survey was conducted at INMOS Corporation (SIC-3674), Colorado Springs, Colorado on October 13, 1981 to evaluate control technology for integrated circuit fabrication. Operations performed at the facility included thermal oxidation; photolithographic processes; wet chemical cleaning and etching; plasma etching; chemical vapor deposition of silicon-dioxide (14808607), silicon-nitride (12033895), and polycrystalline-silicon (7440213); diffusion; ion implantation; metalization by radiofrequency sputtering; and hydrogen annealing. Engineering controls varied by process operation and included isolation, local exhaust ventilation, shielding, and enclosure, and process substitution. Microprocessors were used to control process equipment for several operations. Continuous area monitoring for arsine (7784421) and phosphine (7803512) was performed by infrared spectrophotometry.
Keywords	Environmental surveys Industrial medicine Exposure Toxicity Inspection Hazardous materials Toxic substances Occupational safety and health
Source Agency	National Institute for Occupational Safety and Health
NTIS Subject Category	57U - Public Health & Industrial Medicine 57Y - Toxicology 68G - Environmental Health & Safety
Corporate Authors	Battelle Columbus Labs., OH.; Industrial Environmental Research Lab.-Cincinnati, OH.; National Inst. for Occupational Safety and Health, Cincinnati, OH. Div.
Supplemental Notes	Sponsored in part by Industrial Environmental Research Lab.-Cincinnati, OH., and National Inst. for Occupational Safety and Health, Cincinnati, OH. Div. of Physical Sciences and Engineering.
Document Type	Technical Report
NTIS Issue Number	198414

Preliminary Control Technology Survey of INMOS Corporation, Colorado Springs, Colorado.

Preliminary Control Technology Survey of INMOS Corporation, Colorado Springs, Colorado.
PB84183227

Publication Date	1983
Personal Author	Mihlan, G. J.; Willson, R. D.; Mitchell, R. I.
Page Count	37
Abstract	A walk through survey was conducted at INMOS Corporation (SIC-3674), Colorado Springs, Colorado on October 13, 1981 to evaluate control technology for integrated circuit fabrication. Operations performed at the facility included thermal oxidation; photolithographic processes; wet chemical cleaning and etching; plasma etching; chemical vapor deposition of silicon-dioxide (14808607), silicon-nitride (12033895), and polycrystalline-silicon (7440213); diffusion; ion implantation; metalization by radiofrequency sputtering; and hydrogen annealing. Engineering controls varied by process operation and included isolation, local exhaust ventilation, shielding, and enclosure, and process substitution. Microprocessors were used to control process equipment for several operations. Continuous area monitoring for arsine (7784421) and phosphine (7803512) was performed by infrared spectrophotometry.
Keywords	Environmental surveys Industrial medicine Exposure Toxicity Inspection Hazardous materials Toxic substances Occupational safety and health
Source Agency	National Institute for Occupational Safety and Health
NTIS Subject Category	57U - Public Health & Industrial Medicine 57Y - Toxicology 68G - Environmental Health & Safety
Corporate Authors	Battelle Columbus Labs., OH.; Industrial Environmental Research Lab.-Cincinnati, OH.; National Inst. for Occupational Safety and Health, Cincinnati, OH. Div.
Supplemental Notes	Sponsored in part by Industrial Environmental Research Lab.-Cincinnati, OH., and National Inst. for Occupational Safety and Health, Cincinnati, OH. Div. of Physical Sciences and Engineering.
Document Type	Technical Report
NTIS Issue Number	198414