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Quantitative Analysis of TATB Impurities by Thin Layer Chromatography. Process Development Endeavor No. 205.


DE83007094

Publication Date 1983
Personal Author Schaeffer, C. L.
Page Count 8
Abstract A method for quantitative analysis of impurities in TATB was developed using a densitometer to analyze spots on thin-layer chromatographic plates. The precision associated within the densitometer averaged 3.98% standard deviation. Spotting and developing the plate decreased the precision to 5.4% standard deviation. (ERA citation 08:018561)
Keywords
  • Tatb
  • Impurities
  • Quantitative chemical analysis
  • Thin-layer chromatography
  • Experimental data
  • ERDA/450100
Source Agency
  • Technical Information Center Oak Ridge Tennessee
NTIS Subject Category
  • 79A - Ammunition, Explosives, & Pyrotechnics
  • 99A - Analytical Chemistry
Corporate Authors Mason and Hanger-Silas Mason Co., Inc., Amarillo, TX.; Department of Energy, Washington, DC.
Document Type Technical Report
NTIS Issue Number 198316
Contract Number
  • AC04-76DP00487
Quantitative Analysis of TATB Impurities by Thin Layer Chromatography. Process Development Endeavor No. 205.
Quantitative Analysis of TATB Impurities by Thin Layer Chromatography. Process Development Endeavor No. 205.
DE83007094

  • Tatb
  • Impurities
  • Quantitative chemical analysis
  • Thin-layer chromatography
  • Experimental data
  • ERDA/450100
  • Technical Information Center Oak Ridge Tennessee
  • 79A - Ammunition, Explosives, & Pyrotechnics
  • 99A - Analytical Chemistry
  • AC04-76DP00487
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