National Technical Reports Library - NTRL

National Technical Reports Library

The National Technical Information Service acquires, indexes, abstracts, and archives the largest collection of U.S. government-sponsored technical reports in existence. The NTRL offers online, free and open access to these authenticated government technical reports. Technical reports and documents in its repository may be available online for free either from the issuing federal agency, the U.S. Government Publishing Office’s Federal Digital System website, or through search engines.




Details
Actions:
Download PDFDownload XML
Download

Modeling Pore Corrosion in Normally Open Gold- Plated Copper Connectors.


DE2008942183

Publication Date 2008
Personal Author Moffat, H.; Sun, A.; Enos, D.; Serna, L.; Sorensen, R.
Page Count 122
Abstract The goal of this study is to model the electrical response of gold plated copper electrical contacts exposed to a mixed flowing gas stream consisting of air containing 10 ppb H(sub 2)S at 30 C and a relative humidity of 70%. This environment accelerates the attack normally observed in a light industrial environment (essentially a simplified version of the Battelle Class 2 environment). Corrosion rates were quantified by measuring the corrosion site density, size distribution, and the macroscopic electrical resistance of the aged surface as a function of exposure time. A pore corrosion numerical model was used to predict both the growth of copper sulfide corrosion product which blooms through defects in the gold layer and the resulting electrical contact resistance of the aged surface. Assumptions about the distribution of defects in the noble metal plating and the mechanism for how corrosion blooms affect electrical contact resistance were needed to complete the numerical model. Comparisons are made to the experimentally observed number density of corrosion sites, the size distribution of corrosion product blooms, and the cumulative probability distribution of the electrical contact resistance. Experimentally, the bloom site density increases as a function of time, whereas the bloom size distribution remains relatively independent of time. These two effects are included in the numerical model by adding a corrosion initiation probability proportional to the surface area along with a probability for bloom-growth extinction proportional to the corrosion product bloom volume. The cumulative probability distribution of electrical resistance becomes skewed as exposure time increases. While the electrical contact resistance increases as a function of time for a fraction of the bloom population, the median value remains relatively unchanged. In order to model this behavior, the resistance calculated for large blooms has been weighted more heavily.
Keywords
  • Materials science
  • Electric contacts
  • Copper
  • Corrosion
  • Corrosion products
  • Electric conductivity
  • Gold
  • Water vapor
  • Hydrogen sulfides
  • Plating
  • Mathematical models
Source Agency
  • Technical Information Center Oak Ridge Tennessee
Corporate Authors Sandia National Labs., Albuquerque, NM.; Department of Energy, Washington, DC.
Supplemental Notes Sponsored by Department of Energy, Washington, DC.
Document Type Technical Report
NTIS Issue Number 200910
Contract Number
  • DE-AC04-94AL85000
Modeling Pore Corrosion in Normally Open Gold- Plated Copper Connectors.
Modeling Pore Corrosion in Normally Open Gold- Plated Copper Connectors.
DE2008942183

  • Materials science
  • Electric contacts
  • Copper
  • Corrosion
  • Corrosion products
  • Electric conductivity
  • Gold
  • Water vapor
  • Hydrogen sulfides
  • Plating
  • Mathematical models
  • Technical Information Center Oak Ridge Tennessee
  • DE-AC04-94AL85000
Loading