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Surface Study of Nb/Cu Films for Cavity Deposition by ECR Plasma.

DE2006876018

Publication Date	2005
Personal Author	Wu, A. T.; Ike, R.; Phillips, H. L.; Valente, A. M.; Wang, H.
Page Count	8
Abstract	Niobium (Nb) thin film deposited on copper (Cu) cavities through electron cyclotron resonance (ECR) plasma appears to be an attractive alternative technique for fabricating superconducting radio frequency cavities to be used in particle accelerators. The performance of these obtained Nb/Cu cavities is expected to depend on the surface characteristics of the Nb films. In this report, we investigate the influence of deposition energy on surface morphology, microstructure, and chemical composition of Nb films deposited on small Cu disks employing a metallographic optical microscope, a 3-D profilometer, a scanning electron microscope, and a dynamic secondary ion mass spectrometry. The results will be compared with those obtained on Nb surfaces treated by BCP, EP, and BEP.
Keywords	Niobium Copper Electron cyclotron resonance Plasma Accelerators Deposition Cavities Performance Morphology Microstructure Chemical composition
Source Agency	Technical Information Center Oak Ridge Tennessee
Corporate Authors	Thomas Jefferson National Accelerator Facility, Newport News, VA.; Department of Energy, Washington, DC.
Supplemental Notes	Sponsored by Department of Energy, Washington, DC.
Document Type	Technical Report
NTIS Issue Number	200618

Surface Study of Nb/Cu Films for Cavity Deposition by ECR Plasma.

Surface Study of Nb/Cu Films for Cavity Deposition by ECR Plasma.
DE2006876018

Publication Date	2005
Personal Author	Wu, A. T.; Ike, R.; Phillips, H. L.; Valente, A. M.; Wang, H.
Page Count	8
Abstract	Niobium (Nb) thin film deposited on copper (Cu) cavities through electron cyclotron resonance (ECR) plasma appears to be an attractive alternative technique for fabricating superconducting radio frequency cavities to be used in particle accelerators. The performance of these obtained Nb/Cu cavities is expected to depend on the surface characteristics of the Nb films. In this report, we investigate the influence of deposition energy on surface morphology, microstructure, and chemical composition of Nb films deposited on small Cu disks employing a metallographic optical microscope, a 3-D profilometer, a scanning electron microscope, and a dynamic secondary ion mass spectrometry. The results will be compared with those obtained on Nb surfaces treated by BCP, EP, and BEP.
Keywords	Niobium Copper Electron cyclotron resonance Plasma Accelerators Deposition Cavities Performance Morphology Microstructure Chemical composition
Source Agency	Technical Information Center Oak Ridge Tennessee
Corporate Authors	Thomas Jefferson National Accelerator Facility, Newport News, VA.; Department of Energy, Washington, DC.
Supplemental Notes	Sponsored by Department of Energy, Washington, DC.
Document Type	Technical Report
NTIS Issue Number	200618