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Multilayer Dielectric Gratings for Petawatt-Class Laser Systems.

DE200415006527

Publication Date	2003
Personal Author	Britten, J. A.; Molander, W.; Komashko, A. M.; Barty, C. P. J.
Page Count	14
Abstract	Existing Petawatt class lasers today based on Nd:glass architectures operating at nominally 500 J, 0.5 ps use meter-scale aperture, gold-overcoated master photoresist gratings to compress the amplified chirped pulse. Many lasers operating in the greater than lkJ, greater than Ips regime are in the planning stages around the world. These will require multilayer dielectric diffraction gratings to handle larger peak powers than can be accommodated with gold gratings. Models of the electric field distribution in the solid material of these gratings suggest that high aspect-ratio structures used at high incidence angles will have better laser damage resistance. New tooling for transfer etching these submicron-grating patterns and for nondestructive critical-dimension measurement of these features on meter-scale substrates will be described.
Keywords	Dielectric gratings Lasers Multilayers Aspect ratio Dielectric materials Diffraction gratings Distribution Electric fields Etching Gold Incidence angle Peak loads Planning Substrates Multilayer dielectric gratings Petawatt lasers Chirped pulse amplification Atomic force microscopy Reactive ion milling
Source Agency	Technical Information Center Oak Ridge Tennessee
Corporate Authors	Lawrence Livermore National Lab., CA.; Department of Energy, Washington, DC.
Supplemental Notes	Sponsored by Department of Energy, Washington, DC.
Document Type	Technical Report
NTIS Issue Number	200416

Multilayer Dielectric Gratings for Petawatt-Class Laser Systems.

Multilayer Dielectric Gratings for Petawatt-Class Laser Systems.
DE200415006527

Publication Date	2003
Personal Author	Britten, J. A.; Molander, W.; Komashko, A. M.; Barty, C. P. J.
Page Count	14
Abstract	Existing Petawatt class lasers today based on Nd:glass architectures operating at nominally 500 J, 0.5 ps use meter-scale aperture, gold-overcoated master photoresist gratings to compress the amplified chirped pulse. Many lasers operating in the greater than lkJ, greater than Ips regime are in the planning stages around the world. These will require multilayer dielectric diffraction gratings to handle larger peak powers than can be accommodated with gold gratings. Models of the electric field distribution in the solid material of these gratings suggest that high aspect-ratio structures used at high incidence angles will have better laser damage resistance. New tooling for transfer etching these submicron-grating patterns and for nondestructive critical-dimension measurement of these features on meter-scale substrates will be described.
Keywords	Dielectric gratings Lasers Multilayers Aspect ratio Dielectric materials Diffraction gratings Distribution Electric fields Etching Gold Incidence angle Peak loads Planning Substrates Multilayer dielectric gratings Petawatt lasers Chirped pulse amplification Atomic force microscopy Reactive ion milling
Source Agency	Technical Information Center Oak Ridge Tennessee
Corporate Authors	Lawrence Livermore National Lab., CA.; Department of Energy, Washington, DC.
Supplemental Notes	Sponsored by Department of Energy, Washington, DC.
Document Type	Technical Report
NTIS Issue Number	200416