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Several Technical Measures to Improve Ultra-High and Extreme-High Vacuum.


DE2003807887

Publication Date 2002
Personal Author Dong, C.; Mehrotra, P.; Myneni, G. R.
Page Count 10
Abstract Achieving UHV/XHV without high temperature bake outs is becoming essential in many applications. In this study, we investigated the use of inexpensive silica and titanium oxide thin film coatings on UHV/XHV chambers/components to reduce the adsorption of water on the chamber walls. Water can be cracked into oxygen and hydrogen in the material and act as one of the sources of the hydrogen. We have also implemented backing of the turbo pump with an ion pump for reducing the vacuum chamber pump down times into UHV/XHV pressure range. The results of these investigations are summarized in the paper.
Keywords
  • Vacuum systems
  • Silica
  • Titanium oxides
  • Coatings
  • Adsorption
  • Hydrogen
  • Oxygen
  • Thin films
  • Water
Source Agency
  • Technical Information Center Oak Ridge Tennessee
Corporate Authors Old Dominion Coll., Norfolk, VA. Dept. of Physics.; Virginia Univ., Charlottesville.; Department of Energy, Washington, DC.; Jefferson Lab., Newport News, VA. Theory Group.
Supplemental Notes Prepared in cooperation with Virginia Univ., Charlottesville. and Jefferson Lab., Newport News, VA. Theory Group. Sponsored by Department of Energy, Washington, DC.
Document Type Technical Report
NTIS Issue Number 200321
Several Technical Measures to Improve Ultra-High and Extreme-High Vacuum.
Several Technical Measures to Improve Ultra-High and Extreme-High Vacuum.
DE2003807887

  • Vacuum systems
  • Silica
  • Titanium oxides
  • Coatings
  • Adsorption
  • Hydrogen
  • Oxygen
  • Thin films
  • Water
  • Technical Information Center Oak Ridge Tennessee
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