National Technical Reports Library

The National Technical Information Service acquires, indexes, abstracts, and archives the largest collection of U.S. government-sponsored technical reports in existence. The NTRL offers online, free and open access to these authenticated government technical reports. Technical reports and documents in its repository may be available online for free either from the issuing federal agency, the U.S. Government Publishing Office’s Federal Digital System website, or through search engines.

Details

Orthoclase surface structure dissolution measured in situ by x-ray reflectivity and atomic force microscopy.

DE2001768634

Publication Date	2000
Personal Author	Sturchio, N. C.; Fenter, P.; Cheng, L.; Teng, H.
Page Count	7
Abstract	Orthoclase (001) surface topography and interface structure were measured during dissolution by using in situ atomic force microscopy (AFM) and synchrotrons X-ray reflectivity at pH 1.1-12.9 and T = 25-84 C. Terrace roughening at low pH and step motion at high pH were the main phenomena observed, and dissolution rates were measured precisely. Contrasting dissolution mechanisms are inferred for low- and high-pH conditions. These observations clarify differences in alkali feldspar dissolution mechanisms as a function of pH, demonstrate a new in situ method for measuring face-specific dissolution rates on single crystals, and improve the fundamental basis for understanding alkali feldspar weathering processes.
Keywords	Atomic force microscopy Dissolution Monocrystals Surface properties Feldspars Reflectivity Weathering Interfaces Rock-fluid interactions
Source Agency	Technical Information Center Oak Ridge Tennessee
Corporate Authors	Argonne National Lab., IL.; Department of Energy, Washington, DC.
Document Type	Conference Proceedings
NTIS Issue Number	200125
Contract Number	W-31-109-ENG-38

Orthoclase surface structure dissolution measured in situ by x-ray reflectivity and atomic force microscopy.

Orthoclase surface structure dissolution measured in situ by x-ray reflectivity and atomic force microscopy.
DE2001768634

Publication Date	2000
Personal Author	Sturchio, N. C.; Fenter, P.; Cheng, L.; Teng, H.
Page Count	7
Abstract	Orthoclase (001) surface topography and interface structure were measured during dissolution by using in situ atomic force microscopy (AFM) and synchrotrons X-ray reflectivity at pH 1.1-12.9 and T = 25-84 C. Terrace roughening at low pH and step motion at high pH were the main phenomena observed, and dissolution rates were measured precisely. Contrasting dissolution mechanisms are inferred for low- and high-pH conditions. These observations clarify differences in alkali feldspar dissolution mechanisms as a function of pH, demonstrate a new in situ method for measuring face-specific dissolution rates on single crystals, and improve the fundamental basis for understanding alkali feldspar weathering processes.
Keywords	Atomic force microscopy Dissolution Monocrystals Surface properties Feldspars Reflectivity Weathering Interfaces Rock-fluid interactions
Source Agency	Technical Information Center Oak Ridge Tennessee
Corporate Authors	Argonne National Lab., IL.; Department of Energy, Washington, DC.
Document Type	Conference Proceedings
NTIS Issue Number	200125
Contract Number	W-31-109-ENG-38