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Preparation of Ultra Thin Polystyrene, Polypropylene and Polyethylene Films on Si Substrate Using Spin Coating Technology.


ADA475808

Publication Date 2008
Personal Author Lock, E.; Walton, S.; Fernsler, R.
Page Count 29
Abstract Preparation of ultra thin polystyrene, polypropylene and polyethylene films on silicon substrate using the spin coating technique is discussed in this report. The influence of various process parameters on the obtained film quality including Si wafer preparation, choice of solvent, influence of the solution concentration on the coating and sample positioning on the spin coater are shown. The polymer film surface morphology, thickness and chemical composition were analyzed by atomic force microscopy, profilometery, n&k spectrometry, ellipsometry and X-ray photoelectron spectrometry. Contact angle measurements were performed to characterize the polymer surface energy.
Keywords
  • Polystyrene
  • Thin films
  • Polypropylene
  • Polyethylene
  • Thickness
  • Silicon
  • Surface energy
  • Spin coatings
  • Goniometers
  • Cleaning
  • Wafers
  • X ray photoelectron spectroscopy
  • Substrates
  • Morphology
  • Contact angles
  • Atomic force microscopy
Source Agency
  • Non Paid ADAS
Corporate Authors Naval Research Lab., Washington, DC. Plasma Physics Div.
Supplemental Notes The original document contains color images.
Document Type Technical Report
Title Note Memorandum rept.
NTIS Issue Number 200811
Preparation of Ultra Thin Polystyrene, Polypropylene and Polyethylene Films on Si Substrate Using Spin Coating Technology.
Preparation of Ultra Thin Polystyrene, Polypropylene and Polyethylene Films on Si Substrate Using Spin Coating Technology.
ADA475808

  • Polystyrene
  • Thin films
  • Polypropylene
  • Polyethylene
  • Thickness
  • Silicon
  • Surface energy
  • Spin coatings
  • Goniometers
  • Cleaning
  • Wafers
  • X ray photoelectron spectroscopy
  • Substrates
  • Morphology
  • Contact angles
  • Atomic force microscopy
  • Non Paid ADAS
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